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Metal Alloy High Purity Titanium Sputtering Target

Titanium Sputtering targets are used frequently in flat display coatings, hardware tool coating, decorative coat, semiconductor components and for semiconductor components. This is one reason it's used in the preparation of integrated circuits.

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The application prospects of zirconium hydride powder in the field of hydrogen fuel cells are broad

Zirconium Hydride ZrH2 Powder refers to high-purity zirconium hydride powder. The chemical formula of zirconium hydride is ZrH2, with a density of 5.6g/cm ³; it is a stable powder that is stable to air and water under normal conditions. It can react violently with oxidants and strong acids, burn smoothly during ignition, decompose at 300 ℃ in a vacuum, and completely decompose at 500-700 ℃. Zirconium hydride has a metallic appearance, black powder, and conductivity between metal and semiconductor.

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High Purity Hafnium Silicide HfSi2 Powder CAS 12401-56-8, 99%

Also known as HfSi2, hafnium diilicide or hafnium silicide, its chemical formula is: HfSi2. High-temperature oxidation resistant coatings (cermets) and high temperature structural materials can use HfSi2 as a powder. Purity: 99%Particle Size: 5-10um

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