Metal Alloy High Purity Titanium Sputtering Target

Description of High Purity Titanium Suttering Target for Metal Alloy:   

High purity: Titanium sputtering targets usually have high purity and low content of impurity elements, which is conducive to obtaining high-quality films. Innocence is generally above 99.9%; some can even reach 99.99% or higher.

Good mechanical properties: Titanium sputtering targets have high strength, hardness, flexibility, and toughness. These mechanical properties enable the target to withstand the impact of high-energy particles during sputtering.

Good electrical conductivity: Titanium sputtering targets have good electrical conductivity and can withstand high currents. This allows the target to maintain a stable current during sputtering, producing better film quality.

Good corrosion resistance: Titanium sputtering targets have good corrosion resistance and can remain stable in high temperatures and corrosion environments. This enables the target to resist the erosion of environmental factors during sputtering, ensuring the quality and performance of the film.

Good thermal stability: Titanium sputtering targets have good thermal stability and can maintain structure stability and performance at high temperatures. This enables the target to withstand the influence of high temperature during sputtering, ensuring the quality and performance of the film.

Easy to process: Titanium sputtering targets are easy to process into products of various shapes and sizes. Machining methods include cutting, grinding, polishing, etc., to obtain precise dimensions and surface finish.

Production Method of High Purity Titanium Suttering Target for Metal Alloy:   

Raw material preparation: Select high-purity titanium material as raw material and perform the necessary treatment, such as cutting, grinding, polishing, etc., to obtain accurate size and surface finish.

Smelting and casting: Titanium is melted in a high-temperature furnace and then refined and cast. This step aims to prepare titanium alloys with high purity and stable composition.

Heat treatment: The titanium sputtering target is heat-treated to adjust its structure and properties. In the heat treatment process, it is necessary to control parameters such as temperature control, holding time, and cooling speed to ensure that the hardness and toughness of the target material meet the requirements.

Machining: The titanium sputtering target, after heat treatment, is machined, such as turning, milling, drilling, etc., to obtain the desired shape and size. During machining, attention should be paid to controlling parameters and tool selection to avoid over-machining or under-machining.

Surface treatment: The surface of the titanium sputtering target is polished and coated to increase its corrosion resistance and electrical conductivity. In the surface treatment process, attention should be paid to controlling the treatment temperature, time, atmosphere, and other parameters to ensure that the surface quality and performance meet the requirements.

Quality testing: Quality testing of titanium sputtering targets, including composition analysis, mechanical properties testing, metallographic testing, etc., to ensure its quality and performance meet the requirements.

Application of High Purity Titanium Suttering Target for Metal Alloy:

Optical field: Titanium sputtering targets have been widely used in optics. It can manufacture various optical components, such as mirrors, lenses, grating, etc. These components usually need high precision, high reflectivity, high weather resistance, and other characteristics, and titanium sputtering targets can meet these requirements due to their high purity, high strength, good electrical conductivity, and corrosion resistance.

Electronic field: Titanium sputtering targets are also widely used in electronics. It can manufacture various electronic components, such as circuit boards, capacitors, transformers, etc. These components usually need high electrical conductivity, high corrosion resistance, high stability, and other characteristics, and titanium sputtering targets can meet these requirements.

Aerospace field: Titanium sputtering targets have been widely used in the aerospace field. It can manufacture various aerospace spacecraft, such as aircraft, rockets, satellites, etc. These devices usually need high strength, high corrosion resistance, high stability, and other characteristics, and titanium sputtering targets can meet these requirements.

Medical field: Titanium sputtering targets are also widely used in the medical field. It can manufacture various medical devices, such as surgical instruments, implants, prosthetics, etc. These instruments usually need high corrosion resistance, high biocompatibility, high stability, and other characteristics, and titanium sputtering targets can meet these requirements.

Energy field: Titanium sputtering targets are also widely used in the energy field. It can manufacture various energy devices, such as solar panels, fuel cells, etc. These devices usually need high corrosion resistance, stability, and other characteristics, and titanium sputtering targets can meet these requirements.

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